Reference leak generating device and ultra-fine leak testing device using same

ABSTRACT

There is provided a reference leak generating device capable of precisely generating an ultra-fine reference leak. The reference leak generating device adapted to be connected to an upstream side of a measurement chamber includes a chamber connected to the measurement chamber through an orifice or a porous plug having a molecular flow conductance C and a pressure to establish molecular flow conditions which are known in advance, and is characterized in that a pressure p 1  of testing gas to be introduced into the chamber is precisely determined by using a static expansion method once or more times, and a leak rate of a reference leak at the pressure p 1  is obtained in accordance with a product of C and p 1 .

TECHNICAL FIELD

The present invention relates to a reference leak generating device andan ultra-fine leak testing device using the reference leak generatingdevice, and is used in, for example, an ultra-fine leak testing for anMEMS package, a crystal oscillator, various semiconductor packages, aninfrared sensor package or the like, for which a testing of a very fineleak rate has been required in recent years.

BACKGROUND ART

Conventionally known Kr85 leak testing can be utilized for a leak testup to 10⁻¹³ Pam³/s, but cannot be used in any mass-production machinebecause radioactive isotopes are used.

Further, for an MEMS package, a test of an ultra-fine leak of 10⁻¹³Pam³/s or less is required. However, an existing technology is notapplicable for a highly reliable calibration, and there is not anystandard (reference) for calibration.

For example, in PTL1, there is described a leak gas measuring devicewhich uses a cryopump to measure a fine leak rate from an inspectionobject filled with helium gas. However, this device is not provided withany calibration means.

Additionally, as a national standard of a leak rate in helium leaktesting, 10⁻¹⁰ Pam³/s of National Institute of Standards and Technology(NIST) is minimum. A helium reference leak having a leak rate of 10⁻¹¹Pam³/s by extrapolation of this standard is sold from U.S. corporationsor the like. Therefore, measurement in the range of 10⁻¹⁰ Pam³/s to10⁻¹¹ Pam³/s or less in helium leak testing is an extrapolation value,and has a low reliability.

In addition, at present, a calibrated helium standard leak is attachedto a helium leak testing device. However, since one-point calibration isperformed, a linearity of a measuring unit cannot be confirmed.

On the other hand, the present inventors have previously filedapplications relating to a calibration method and a calibration deviceof a microporous filter for standard mixed gas leak (PTL2) and to areference minute gas flow rate introduction device using a microporousfilter (PTL3), concerning the microporous filter which becomes amolecular flow.

CITATION LIST Patent Literature

-   PTL1: Japanese Unexamined Patent Publication No. 2004-184207-   PTL2: Japanese Unexamined Patent Publication No. 2011-47855-   PTL3: Japanese Unexamined Patent Publication No. 2012-154720

SUMMARY OF INVENTION Technical Problem

Therefore, the present invention has been developed to solve the aboveproblems, and an object thereof is to provide a reference leakgenerating device which, instead of an extrapolation value, actuallygenerates a reference leak of 10⁻¹¹ Pam³/s or less, and also provide anultra-fine leak testing device in which by use of the reference leakgenerating device, on the spot, a reference leak is introduced into ameasurement chamber of the leak testing device to calibrate a partialpressure analyzer (a mass spectrometer) which detects a leak, therebyachieving a high reliability.

Solution to Problem

In order to solve the above problems, a reference leak generating deviceaccording to the present invention introduces a reference leak of 10⁻¹¹Pam³/s or less into a measurement chamber or the like through anorifice, a porous plug or the like having a molecular flow conductance Cand pressure conditions to realize a molecular flow which are known inadvance. When p₁>>p₂ is established where an upstream pressure of theorifice or the porous plug is p₁ and a downstream pressure thereof isp₂, a leak rate Q is a product of C and p₁. By making the upstreampressure p₁ smaller, the ultra-fine leak rate Q is generated. Toprecisely determine the upstream pressure p₁, a static expansion methodis used once or several times.

Further, the upstream pressure p₁ is set so that testing gas passing theorifice, the porous plug or the like satisfies molecular flowconditions. When the molecular flow conditions are established, C is aconstant, which is beforehand calculated or measured.

Additionally, the ultra-fine leak testing device according to thepresent invention can directly calibrate a partial pressure analyzermeasuring the leak rate, by using the above reference leak generatingdevice to introduce the reference leak of 10⁻¹¹ Pam³/s or less bytesting gas into the measurement chamber of the leak testing device.When the leak rate is about 10⁻¹¹ Pam³/s, it is possible to carry out atest even while discharging testing gas by means of a vacuum pump.Furthermore, there is measured a partial pressure of testing gas when anintroduction flow rate and a discharge rate are equilibrated, to measurethe leak rate. In this case, even when any inert gas is not used, it ispossible to carry out the test.

However, in the case of the ultra-fine leak of 10⁻¹² Pam³/s or less, amethod of introducing testing gas into a vacuum container which issealed and maintained at a high vacuum to store and measure testing gasis more advantageous in that a measurement sensitivity is enhanced. Inthis case, an entrapment vacuum pump such as a non-evaporable getterpump or a cryopump is used as the vacuum pump, and inert gas (helium orthe like) for which the above entrapment vacuum pump does not have anydischarge ability is used as testing gas. When the reference leak isintroduced into a fine leak measuring section evacuated by the aboveentrapment vacuum pump, testing gas is not discharged, and is thereforeaccumulated in the vacuum container of the fine leak measuring section.An increasing rate of the partial pressure of testing gas is measured bymeans of the partial pressure analyzer. An output signal of the partialpressure analyzer has a unit of A (ampere), and hence the increasingrate of the partial pressure to be obtained has a dimension of A/s. Whenthe increasing rate is compared with the reference leak having the knownleak rate, the dimension can be converted to a unit (Pam³/s, g/s, mol/s,number/s, atm-cc/s or the like) indicating an absolute value of the leakrate, and calibration can be performed.

Next, by a vacuum spray method, a vacuum hood method, a pressure vacuummethod (a bombing method) or the like, testing gas released from a testpiece is introduced into a vacuum device evacuated by the samenon-evaporable getter pump or cryopump, and a partial pressure increaseof testing gas at this time is measured with the calibrated partialpressure analyzer, thereby measuring the leak rate.

That is, the reference leak generating device according to the presentinvention is a reference leak generating device adapted to be connectedto an upstream side of a measurement chamber, and includes a chamberconnected to the measurement chamber through an orifice or a porous plughaving a molecular flow conductance C and a pressure to establishmolecular flow conditions which are known in advance, a pressure p₁ oftesting gas to be introduced into the chamber being precisely determinedby using a static expansion method once or more times, and being set sothat testing gas flowing through the orifice or the porous plugsatisfies the molecular flow conditions, and a leak rate of a referenceleak at the pressure p₁ being obtained in accordance with a product of Cand p₁.

The present invention is also characterized in that in the referenceleak generating device, the static expansion method is performed byexpanding a volume of testing gas from V₀ to V₀+V₁ between a secondchamber of the volume V₁ which is connected to the upstream side of themeasurement chamber and a first chamber of the volume V₀ which isconnected to an upstream side of the second chamber.

Further, the present invention provides an ultra-fine leak testingdevice or an outgassing measurement device including a reference leakgenerating section constituted of the above reference leak generatingdevice and a fine leak measuring section, the fine leak measuringsection including a measurement chamber for measuring a leak or anoutgassing from a test piece, a partial pressure analyzer connected tothe measurement chamber, and an entrapment vacuum pump connected to themeasurement chamber and adapted not to trap testing gas, the referenceleak generating section comprising, on the upstream side of themeasurement chamber, the chamber connected to the measurement chamberthrough the orifice or the porous plug having the molecular flowconductance C and the pressure to establish the molecular flowconditions which are known in advance, wherein the pressure p₁ oftesting gas to be introduced into the chamber is precisely determined byusing the static expansion method once or more times, and is set so thattesting gas flowing through the orifice or the porous plug satisfies themolecular flow conditions, the leak rate of the reference leak at thistime is obtained in accordance with the product of C and p₁, anincreasing rate of a partial pressure of testing gas is measured withthe partial pressure analyzer, and an increasing rate of an outputsignal of the partial pressure analyzer is compared with the leak rateof the reference leak to perform calibration.

The present invention is also characterized in that in the ultra-fineleak testing device or the outgassing measurement device, testing gas isinert gas such as helium or the like.

Additionally, the present invention provides an ultra-fine leak testingdevice or an outgassing/permeation measurement device including areference leak generating section constituted of the above referenceleak generating device and a fine leak measuring section, the fine leakmeasuring section including a measurement chamber for measuring a leakor an outgassing from a test piece, a partial pressure analyzerconnected to the measurement chamber, and a kinetic vacuum pumpconnected to the measurement chamber, the reference leak generatingsection including, on the upstream side of the measurement chamber, thechamber connected to the measurement chamber through the orifice or theporous plug having the molecular flow conductance C and the pressure toestablish the molecular flow conditions which are known in advance,wherein the pressure p₁ of testing gas to be introduced into the chamberis precisely determined by using the static expansion method once ormore times, and is set so that testing gas flowing through the orificeor the porous plug satisfies the molecular flow conditions, the leakrate of the reference leak at this time is obtained in accordance withthe product of C and p₁, and a partial pressure of testing gas inequilibrium conditions which is measured with the partial pressureanalyzer is compared with the leak rate of the reference leak to performcalibration.

Advantageous Effects of Invention

According to the reference leak generating device of the presentinvention, instead of an extrapolation value, a reference leak of 10⁻¹¹Pam³/s or less can precisely be generated on the spot, and according tothe ultra-fine leak testing device of the present invention, thereference leak can be introduced into the leak testing device on thespot, to carry out a test while confirming that measurement can beperformed, thereby achieving a high reliability.

Further, according to the ultra-fine leak testing device of the presentinvention, instead of one-point calibration, it is possible to carry outmultipoint calibration, and hence a linearity of a partial pressureanalyzer (a mass spectrometer) which measures a leak rate can beconfirmed.

In addition, according to the ultra-fine leak testing device of thepresent invention, any radioactive substance is not used, a deviceconstitution is not complicated, and hence the device can be applied toa mass production machine.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is an explanatory view schematically showing a reference leakgenerating device according to the present invention and an ultra-fineleak testing device using the reference leak generating device.

FIG. 2 is a view showing an embodiment of the reference leak generatingdevice according to the present invention and the ultra-fine leaktesting device using the reference leak generating device.

FIG. 3 is a diagram for explaining first expansion of a static expansionmethod.

FIG. 4 is a diagram for explaining second expansion of the staticexpansion method.

FIG. 5 is a diagram showing, in double logarithmic scale, a relationbetween an introduction flow rate and an increasing rate when anexpanding operation is repeated.

FIG. 6 is a diagram showing a ratio between the introduction flow rateand the increasing rate when the expanding operation is repeated.

FIG. 7 is a diagram showing the result of a leak inspection of fivecylindrical MEMS samples each having a diameter of 0.5 mm and a lengthof 4 mm by use of the present invention.

DESCRIPTION OF EMBODIMENTS

FIG. 1 shows a schematic view of a reference leak generating deviceaccording to the present invention, and an ultra-fine leak testingdevice according to the present invention which uses the reference leakgenerating device as a reference leak generating section. As shown inthe drawing, the ultra-fine leak testing device has the reference leakgenerating section and a fine leak measuring section. The ultra-fineleak testing device includes a first chamber of a volume V₀, a secondchamber of a volume V₁, and a measurement chamber of a volume V₂Pressures of the second chamber and the measurement chamber arerepresented by p₁, p₂, and p₀ is an initial pressure of testing gasbefore expansion which is measured with a pressure gauge or a vacuumgauge such as a capacitance diaphragm gauge when the testing gas (aninert gas such as helium or the like) is introduced into the firstchamber.

By repeating a static expansion method (in which V₀ is expanded to(V₀+V₁)) in the reference leak generating section constituting thereference leak generating section, the pressure p₁ can precisely bedetermined to a low pressure, and Pi can precisely be determined inaccordance with:

p₁={V₀/(V₀+V₁)}^(n)p₀, in which n is the number of times of expansion.At this time, the pressure p₁ is set so that the testing gas flowingthrough an orifice or a porous plug satisfies molecular flow conditions.

Testing gas is introduced from the second chamber to the measurementchamber of the fine leak measuring section through the orifice or theporous plug in which a molecular flow conductance C and a pressure toestablish the molecular flow conditions are clarified. C is calculatedor measured in advance.

The pressure of the measurement chamber is measured with a partialpressure analyzer (QMS or the like), and the measurement chamber isevacuated by an entrapment vacuum pump (a non-evaporable getter (NEG)pump, a cryopump or the like) which does not trap testing gas. At thistime, a reference leak rate Q_(R)(Pam³/s) from the second chamber to themeasurement chamber can be obtained in accordance with Equation (1).

Q _(R) =Cp ₁ =C·{V ₀/(V ₀ +V ₁)}^(n) p ₀  (1)

On the other hand, when a leak rate Q_(S) (Pam³/s) from a test piece ismeasured in the fine leak measuring section, an ultra-fine leak ismeasured with the partial pressure analyzer. At this time, impurity gasother than testing gas is trapped by the non-evaporable getter pump, andthe partial pressure analyzer is set to be suitably operable, to measureonly testing gas (helium or the like). The reference leak rate Q_(R) iscompared with the leak rate Q_(S) from the test piece, to quantitativelymeasure Q_(S). Helium gas is not trapped by the entrapment vacuum pumpsuch as the NEG pump or the cryopump, and hence a partial pressure oftesting gas monotonously increases and can therefore be obtained inaccordance with Equation (2).

Q _(S) =V ₂·(dp ₂ /dt)  (2)

An increasing rate of the helium partial pressure is measured with thepartial pressure analyzer. At this time, impurity gas released from thechamber or the like is trapped by the entrapment vacuum pump (the NEGpump, the cryopump or the like) which does not trap testing gas, andtherefore the partial pressure analyzer can operate at a suitablepressure.

It is noted that an ultra-fine leak rate from the test piece includes,for example, a leak of a filling gas (e.g., helium or the like) from agas filling package or the like, and an outgassing from a material orthe like.

EXAMPLE

FIG. 2 shows an embodiment of a reference leak generating deviceaccording to the present invention, and an ultra-fine leak testingdevice according to the present invention which uses the reference leakgenerating device as a reference leak generating section. Abbreviationsin the drawing indicate QMS: a quadrupole mass spectrometer, IG: anionization gauge, NEG pump: a non-evaporable getter pump, RP: a rotarypump, TMP: a turbo molecular pump, DP: a dry pump, and a capacitancediaphragm gauge (F.S. 133 Pa): a capacitance diaphragm gauge having afull scale of 133 Pa.

The device is divided into a first chamber of a volume V₀, a secondchamber of a volume V₁, and a measurement chamber of a volume V₂. Thecapacitance diaphragm gauge for measuring a helium pressure beforeexpansion is attached to the first chamber, the IG for measuring abackground pressure is attached to the second chamber, and the QMS formeasuring helium and the NEG pump for trapping impurity gas other thanhelium are attached to the measurement chamber.

The first chamber can be closed by using two front and rear valves. Thesecond chamber can be made in a closed state by closing a valve 1, avalve 2 and a valve 3. Afterward, by opening the valve 1, helium storedin the first chamber is expanded to the second chamber. The secondchamber is connected to the measurement chamber through a porous plugand the valve 3, and by closing the valve 3, helium can be introducedfrom the second chamber into the measurement chamber only through theporous plug.

Calibration of the QMS is performed in a state where the valve 3 isclosed. By helium flowing into the measurement chamber through theporous plug, a helium partial pressure in the measurement chamberincreases, and hence an increasing rate of the partial pressure ismeasured with the QMS. On the other hand, a flow rate of helium flowinginto the measurement chamber can precisely be obtained in accordancewith Equation (1):

Q _(R) =Cp ₁ =C·{V ₀/(V ₀ +V ₁)}^(n) p ₀.

Therefore, the partial pressure increasing rate of helium which ismeasured with the QMS is compared with the introduction flow rate ofhelium which is obtained in accordance with the above equation, so thatthe QMS can be calibrated. During this calibration, impurity gasreleased from a wall or the like in the measurement chamber is trappedby the NEG pump, and therefore the helium partial pressure measurementis not disturbed.

Next, leak testing of a test piece is carried out. As a method of leaktesting, a vacuum spray method, a vacuum hood method, or a pressurevacuum method (a bombing method) is applicable. During this testing, thevalve 3 is beforehand closed in the same manner as in the calibration.When there is a leak, the helium partial pressure in the measurementchamber increases due to helium leaking out from the test piece. Fromthe increasing rate of the helium partial pressure and the abovecalibration result, a leak rate from the test piece can be measured.Since volumes of the test piece and a connecting tube also have aninfluence on the increasing rate of the helium partial pressure, thesevolumes should be separately obtained in advance as required.

In FIG. 3, the result of first expansion is shown.

The valve 3 was closed to perform background measurement.

The valve 2 was closed to expand He gas from a volume V₀ to V₀+V₁. Atthis time, an initial pressure p₀=114.22 Pa, a pressure p₁ after theexpansion=7.77 Pa, and an expansion ratio=14.69, and He gas passedthrough the porous plug to be stored in a volume V₂.

The valve 1 was closed, the valve 2 was opened, the volume V₁ wasevacuated, and He gas was not introduced into the volume V₂. Backgroundmeasurement 2 was performed.

The valve 3 was opened, He gas stored in the volume V₂ was pumped out,and a zero point was confirmed.

A leak rate of He gas was

Q _(R)=3.04×10⁻⁹×7.77=2.36×10⁻⁸ (Pam³/s),

and the increasing rate (an inclination) of a He gas signal was1.97×10⁻⁸ (A/s). At this time, a secondary electron multiplier of theQMS was set to ON.

In FIG. 4, the result of second expansion is shown.

Similarly to the first time, the valve 3 was closed to perform thebackground measurement.

The valve 2 was closed to expand He gas from the volume V₀ to V₀+V₁. Atthis time, an initial pressure p₀=7.77 Pa (P₀ herein was used toindicate the pressure of the first chamber before the second expansion),the pressure p₁ after the expansion=7.77/14.69=0.525 Pa, and He gaspassed through the porous plug to be stored in the volume V₂.

The valve 1 was closed, the valve 2 was opened, the volume V₁ wasevacuated, and He gas was not introduced into the volume V₂. Thebackground measurement 2 was performed.

The valve 3 was opened, He gas stored in the volume V₂ was pumped out,and the zero point was confirmed.

The leak rate of He gas was

Q _(R)=3.04×10⁻⁹×0.525=1.06×10⁻⁹ (Pam³/s),

and the increasing rate (the inclination) of the He gas signal was1.60×10⁻⁹ (A/s).

FIG. 5 is a graph in which the results obtained when the expandingoperation was repeated six times are plotted on double logarithmic scalewith the vertical axis indicating the increasing rate (A/s) of thehelium signal and the horizontal axis indicating the introduction flowrate Q_(R) (Pam³/s) of helium. It is shown that the increasing rate ofthe He gas signal enlarges in proportion to the introduced leak rateQ_(R). Similarly, there are also plotted in FIG. 5 the results of themeasurement in a state where the secondary electron multiplier (SEM) ofthe QMS was set to OFF. It is shown that an obtained ion current (A)becomes smaller, but similarly, a proportional relation is obtained.

FIG. 6 is a graph in which the vertical axis indicates a ratio(A/s)/(Pam³/s) between the increasing rate of the helium gas signal andthe introduction flow rate, and the horizontal axis indicates theintroduction flow rate Q_(R) (Pam³/s) of helium. It is shown that arelative ratio between Q_(R) and the increasing rate of the He gassignal is constant, i.e., results of an introduction rate and ameasurement rate are matched. This also applies to the result of themeasurement in the state where the secondary electron multiplier of theQMS was set to OFF (the result multiplied by 100 times is also plotted).

Therefore, an output signal of the partial pressure analyzer has a unitof A (ampere), and hence the increasing rate of the partial pressure tobe obtained has a dimension of A/s, but when the increasing rate iscompared with the reference leak with the known leak rate, the dimensioncan be converted to a unit (Pam³/s, g/s, mol/s, number/s, atm-cc/s orthe like) indicating an absolute value of the leak rate, and this unitcan be utilized as a standard during the calibration process.

There will be described below the result of a leak inspection of fivecylindrical MEMS samples each having a diameter of 0.5 mm and a lengthof 4 mm by use of the present invention. By using a separate device,MEMS samples were exposed (subjected to a bombing) in helium gas ofthree atmospheres for 94 hours after evacuation. Subsequently, within 50minutes after opening to the atmospheric air, Each of the MEMS samplesexposed in helium gas was introduced into the test piece chamber shownin FIG. 2. After the evacuation, the valve 3 was closed, and an increaseof the He gas signal was measured with the partial pressure analyzer.The result is shown in FIG. 7. For comparison, there is also shown inFIG. 7 the results of two blank tests (the result when the MEMS samplewas not disposed in the test piece chamber) which were carried outbefore and after the measurement of the MEMS sample. The secondaryelectron multiplier of the QMS was set to OFF.

From FIG. 7, it is seen that the increasing rate of helium obtained froma sample number 3D is clearly larger than those obtained from the othersample numbers. This is because “a leak” was present in the samplenumber 3D, helium gas permeated into the MEMS during the process ofbeing exposed in helium gas of three atmospheres, and the penetratinghelium gas was released again in the device of FIG. 2. The increasingrate of helium is 2.88×10⁻¹³ A/s, and hence according to the calibrationresult (FIG. 5), a size of the leak can quantitatively be determined as1.87×10⁻¹⁰ Pa/m³·s. In the results of the other four samples (1A, 2A, 4Aand 5D), as compared with the test results of the blanks, the increasingrate of helium became slightly larger, but this is supposedly becausehelium gas permeated into glass used in a sealing material of the MEMS.Consequently, it has been confirmed that by use of the presentinvention, a fine leak of order of 10⁻¹⁰ Pa/m³·s can easily,quantitatively be measured for an inspection time of about 60 seconds.

In the above description of the embodiment, the entrapment vacuum pumpis used and the case where helium is used has been described. However,it is obvious that the present invention is applicable to the case whereanother inert gas is used.

(Modification)

Further, the reference leak generating device according to the presentinvention can be used in combination with a measuring section in which akinetic vacuum pump such as a turbo molecular pump or the like is usedinstead of the entrapment vacuum pump. As described above in paragraph0005, when a leak rate is about 10⁻¹¹ Pam³/s, it is possible to carryout a test while pumping out testing gas by the vacuum pump, and thereis measured a partial pressure of testing gas when an introduction flowrate and an effective pumping-out speed are equilibrated, so that theleak rate can be measured. In this case, testing gas having a known flowrate is introduced into the measuring section, and there is measured thepartial pressure of testing gas when the introduction flow rate and theeffective pumping-out speed are equilibrated, to perform the measurementof the leak rate and calibration of a partial pressure analyzer. In amethod in which the kinetic vacuum pump is used, even when gas otherthan inert gas is used, it is possible to measure the leak rate, but ameasurement lower limit becomes higher as compared with the above methodof the embodiment in which the entrapment vacuum pump is used. When anoutgassing or gas permeation from a material or the like is measured,there is a high possibility that gas other than inert gas is released,and hence the kinetic vacuum pump is more suitably used.

1. A reference leak generating device adapted to be connected to anupstream side of a measurement chamber, comprising: a chamber connectedto the measurement chamber through an orifice or a porous plug having amolecular flow conductance C and a pressure to establish molecular flowconditions which are known in advance, wherein a pressure p₁ of testinggas to be introduced into the chamber is precisely determined by astatic expansion method of one time or more, and is set so that testinggas flowing through the orifice or the porous plug satisfies themolecular flow conditions, and a leak rate of a reference leak at thepressure p₁ is obtained in accordance with a product of C and p₁.
 2. Thereference leak generating device according to claim 1, wherein thestatic expansion method is performed by expanding a volume of testinggas from V₀ to V₀+V₁ between a second chamber of the volume V₁ which isconnected to the upstream side of the measurement chamber and a firstchamber of the volume V₀ which is connected to an upstream side of thesecond chamber.
 3. An ultra-fine leak testing device or an outgassingmeasurement device comprising a reference leak generating sectionconstituted of the reference leak generating device according to claim1, and a fine leak measuring section, said fine leak measuring sectionincluding a measurement chamber for measuring a leak or an outgassingfrom a test piece, a partial pressure analyzer connected to themeasurement chamber, and an entrapment vacuum pump connected to themeasurement chamber and adapted not to trap testing gas, said referenceleak generating section comprising, on the upstream side of themeasurement chamber, the chamber connected to the measurement chamberthrough the orifice or the porous plug having the molecular flowconductance C and the pressure to establish the molecular flowconditions which are known in advance, wherein the pressure p₁ oftesting gas to be introduced into the chamber is precisely determined byusing the static expansion method once or more times, and is set so thattesting gas flowing through the orifice or the porous plug satisfies themolecular flow conditions, the leak rate of the reference leak at thistime is obtained in accordance with the product of C and p₁, anincreasing rate of a partial pressure of testing gas is measured withthe partial pressure analyzer, and an increasing rate of an outputsignal of the partial pressure analyzer is compared with the leak rateof the reference leak to perform calibration.
 4. The ultra-fine leaktesting device or the outgassing measurement device according to claim3, wherein testing gas is inert gas such as helium or the like.
 5. Anultra-fine leak testing device or an outgassing/permeation measurementdevice comprising a reference leak generating section constituted of thereference leak generating device according to claim 1, and a fine leakmeasuring section, said fine leak measuring section including ameasurement chamber for measuring a leak or an outgassing from a testpiece, a partial pressure analyzer connected to the measurement chamber,and a kinetic vacuum pump connected to the measurement chamber, saidreference leak generating section comprising, on the upstream side ofthe measurement chamber, the chamber connected to the measurementchamber through the orifice or the porous plug having the molecular flowconductance C and the pressure to establish the molecular flowconditions which are known in advance, wherein the pressure p₁ oftesting gas to be introduced into the chamber is precisely determined byusing the static expansion method once or more times, and is set so thattesting gas flowing through the orifice or the porous plug satisfies themolecular flow conditions, the leak rate of the reference leak at thistime is obtained in accordance with the product of C and p₁, and apartial pressure of testing gas in equilibrium conditions which ismeasured with the partial pressure analyzer is compared with the leakrate of the reference leak to perform calibration.